20.500.12556/RUNG-3229-ab098944-e2ac-acbc-1d23-da86efb42ecd
Atomic-level mechanisms of magnesium oxidation
Magnesium has been recently becoming an increasingly popular material for various applications. However, excessive chemical reactivity, and oxidation rate in particular, is a major obstruction on the way of Mg to become widely adopted. A significant problem causing the lack of Mg reactivity control is insufficient understanding of mechanisms involved in the oxidation of magnesium surface. Herewith we present the investigation of atomic-level mechanisms of oxidation initiation and propagation in pure Mg. Namely, X-ray photoelectron spectroscopy at synchrotron Elettra was used as a surface sensitive direct method to determine the valence of Mg and O and the valence band states at the early stage of oxide formation over a principal, most densely packed, crystallographic plane (0001) in pure Mg. The mechanisms of oxygen adsorption on magnesium free surface followed by oxidation (i.e. initiation and kinetics of MgO formation) are clarified. Copyright © 2016 by The Minerals, Metals & Materials Society. All rights reserved.
Magnesium
Oxidation
Synchrotron radiation
X-ray photoelectron spectroscopy
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Angleški jezik
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2017-08-24 15:32:37
2017-08-25 09:34:43
2023-06-09 03:21:13
0000-00-00 00:00:00
2016
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4
73
2016
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NiDoloceno
NiDoloceno
NiDoloceno
0000-00-00
0000-00-00
0000-00-00
4880635
URN:SI:UNG:REP:GJHT3ZN2
Univerza v Novi Gorici
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1
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