Atomic-level mechanisms of magnesium oxidationDmytro Orlov
, Matjaž Valant
, SANDRA GARDONIO
, Mattia Fanetti
, 2016, published scientific conference contribution
Abstract: Magnesium has been recently becoming an increasingly popular material for various applications. However, excessive chemical reactivity, and oxidation rate in particular, is a major obstruction on the way of Mg to become widely adopted. A significant problem causing the lack of Mg reactivity control is insufficient understanding of mechanisms involved in the oxidation of magnesium surface. Herewith we present the investigation of atomic-level mechanisms of oxidation initiation and propagation in pure Mg. Namely, X-ray photoelectron spectroscopy at synchrotron Elettra was used as a surface sensitive direct method to determine the valence of Mg and O and the valence band states at the early stage of oxide formation over a principal, most densely packed, crystallographic plane (0001) in pure Mg. The mechanisms of oxygen adsorption on magnesium free surface followed by oxidation (i.e. initiation and kinetics of MgO formation) are clarified. Copyright © 2016 by The Minerals, Metals & Materials Society. All rights reserved.
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Summary of found: ...and propagation in pure Mg. Namely, X-ray photoelectron spectroscopy at synchrotron Elettra was used as...
Keywords: Magnesium, Oxidation, Synchrotron radiation, X-ray photoelectron spectroscopy
Published: 25.08.2017; Views: 1842; Downloads: 0
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