20.500.12556/RUNG-6307
Atomic layer deposition for the photoelectrochemical applications
Substantial progress has been made in the photoelectrochemical (PEC) field to understand the photoelectrode behavior, semiconductor‐electrolyte interface, and photocorrosion, enabling new photoelectrode architectures with higher photocurrent, reduced photovoltage losses, and longer lifetime. Nevertheless, for practical PEC applications additional efforts are still needed to optimize all components of the photoelectrodes, including the light absorbing semiconductors, the layers for charge extraction, charge transfer, corrosion protection, and catalysis. In this regard, atomic layer deposition (ALD) offers new opportunities due to the monolayer‐by‐monolayer deposition approach, allowing preparation of conformal films with precisely controlled thickness and composition. As the ALD instruments are becoming widely accessible, this review aims to make an overview of the applications for photoelectrodes fabrication. The deposition of semiconductors onto flat and nano‐textured substrates, the deposition of ultrathin interlayers to ease charge transport by energy band alignment and surface states passivation, the deposition of corrosion protection layers, and finally, the possibilities for high catalyst dispersion is presented.
atomic layer deposition
charge recombination
charge transfer
photocorrosion
photoelectrochemical water splitting
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true
false
Angleški jezik
Ni določen
Neznano
2021-02-25 09:58:23
2021-02-25 13:13:37
2023-06-09 03:42:38
0000-00-00 00:00:00
2021
0
0
str. 1-22
iss.
Vol.
2021
0000-00-00
NiDoloceno
NiDoloceno
NiDoloceno
0000-00-00
0000-00-00
0000-00-00
53115651
620.1/.2
2196-7350
10.1002/admi.202002100
URN:SI:UNG:REP:5WBO9XDN
https://onlinelibrary.wiley.com/doi/10.1002/admi.202002100
1
https://repozitorij.ung.si/Dokument.php?lang=slv&id=21660
Univerza v Novi Gorici
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