Repozitorij Univerze v Novi Gorici

Izpis gradiva
A+ | A- | Pomoč | SLO | ENG

Naslov:Chemical Instability of an Interface between Silver and Bi2Se3 Topological Insulator at Room Temperature
Avtorji:ID Ferfolja, Katja, Materials Research Laboratory, University of Nova Gorica (Avtor)
ID Valant, Matjaž, Materials Research Laboratory, University of Nova Gorica, Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China (Avtor)
ID Mikulska, Iuliia, Diamond Light Source Ltd., Harwell Science and Innovation Campus (Avtor)
ID Gardonio, Sandra, Materials Research Laboratory, University of Nova Gorica (Avtor)
ID Fanetti, Mattia, Materials Research Laboratory, University of Nova Gorica (Avtor)
Datoteke: Gradivo nima datotek, ki so prostodostopne za javnost. Gradivo je morda fizično dosegljivo v knjižnici fakultete, zalogo lahko preverite v COBISS-u. Povezava se odpre v novem oknu
Jezik:Angleški jezik
Vrsta gradiva:Delo ni kategorizirano
Tipologija:1.01 - Izvirni znanstveni članek
Organizacija:UNG - Univerza v Novi Gorici
Opis:Understanding an interaction at an interface between a topological insulator and a metal is of critical importance when designing electronic and spintronic devices or when such systems are used in catalysis. In this paper, we report on a chemical instability of the interface between Bi2Se3 and Ag studied by X-ray powder diffraction and electron microscopy. We present strong experimental evidence of a redox solid-state reaction occurring at the interface with kinetics that is significant already at room temperature. The reaction yields Ag2Se, AgBiSe2, and Bi. The unexpected room-temperature chemical instability of the interface should be considered for all future theoretical and applicative studies involving the interface between Bi2Se3 and Ag.
Ključne besede:topological insulators, Ag, thin metal films, interfaces, redox reaction
Leto izida:2018
Št. strani:9980-9984
Številčenje:122
PID:20.500.12556/RUNG-5565-77f7e224-58ac-e1ce-a83e-27b365f6f792 Novo okno
COBISS.SI-ID:5205243 Novo okno
DOI:10.1021/acs.jpcc.8b01543 Novo okno
NUK URN:URN:SI:UNG:REP:MCWSSWH4
Datum objave v RUNG:17.06.2020
Število ogledov:3069
Število prenosov:0
Metapodatki:XML RDF-CHPDL DC-XML DC-RDF
:
Kopiraj citat
  
Skupna ocena:(0 glasov)
Vaša ocena:Ocenjevanje je dovoljeno samo prijavljenim uporabnikom.
Objavi na:Bookmark and Share


Postavite miškin kazalec na naslov za izpis povzetka. Klik na naslov izpiše podrobnosti ali sproži prenos.

Gradivo je del revije

Naslov:The Journal of Physical Chemistry C
Skrajšan naslov:J. Phys. Chem. C
Leto izida:2018

Licence

Licenca:CC BY-NC-ND 4.0, Creative Commons Priznanje avtorstva-Nekomercialno-Brez predelav 4.0 Mednarodna
Povezava:http://creativecommons.org/licenses/by-nc-nd/4.0/deed.sl
Opis:Najbolj omejujoča licenca Creative Commons. Uporabniki lahko prenesejo in delijo delo v nekomercialne namene in ga ne smejo uporabiti za nobene druge namene.
Začetek licenciranja:15.06.2020

Nazaj