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Title:Fractal and inertia moment analyses for thin film quality monitoring
Authors:Mohanachandran Nair Sindhu, Swapna (Author)
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Language:English
Work type:Not categorized (r6)
Tipology:1.01 - Original Scientific Article
Organization:UNG - University of Nova Gorica
Abstract:The widespread applications of thin films in optronics demand innovative techniques for its characterizations. The work reported here proposes electronic speckle pattern interferometry and fractal-based methods for assessing the quality of thin films taking the industrially relevant molybdenum oxide (MoO3) incorporated niobium oxide (Nb2O5) films. The films with different levels of MoO3 incorporation (1, 2, 3, 5, and 10 wt. %) are prepared by radio frequency sputtering. The study reveals the structure modifications of Nb2O5 from the orthorhombic to monoclinic phases with an associated morphological variation revealed through atomic force microscopy and field-emission scanning electron microscopy analyses. The films’ specklegrams are recorded under thermal stress; the inertia moment (IM) and fractal analyses are computed and compared with the root-mean-square surface roughness of the films. The lacunarity analysis of the AFM films agrees well with the specklegrams. Thus, the lower IM and lacunarity values of the specklegrams can be regarded as indicators of the good quality of thin films.
Keywords:cross-correlation, fractal dimension, inertia moment, lacunarity, speckle, surface roughness.
Year of publishing:2022
Number of pages:15
Numbering:61, 4
COBISS_ID:113431555  Link is opened in a new window
URN:URN:SI:UNG:REP:WEZFL1VV
DOI:10.1117/1.OE.61.4.044106 Link is opened in a new window
License:CC BY-NC-ND 4.0
This work is available under this license: Creative Commons Attribution Non-Commercial No Derivatives 4.0 International
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Record is a part of a journal

Title:Optical Engineering
ISSN:1560-2303
Year of publishing:2022

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