| Title: | Fractal and inertia moment analyses for thin film quality monitoring |
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| Authors: | Mohanachandran Nair Sindhu, Swapna (Author) |
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| Files: | This document has no files. This document may have a phisical copy in the library of the organization, check the status via COBISS.  |
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| Language: | English |
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| Work type: | Not categorized (r6) |
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| Tipology: | 1.01 - Original Scientific Article |
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| Organization: | UNG - University of Nova Gorica |
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| Abstract: | The widespread applications of thin films in optronics demand innovative techniques for its characterizations. The work reported here proposes electronic speckle pattern interferometry and fractal-based methods for assessing the quality of thin films taking the industrially relevant molybdenum oxide (MoO3) incorporated niobium oxide (Nb2O5) films. The films with different levels of MoO3 incorporation (1, 2, 3, 5, and 10 wt. %) are prepared by radio frequency sputtering. The study reveals the structure modifications of Nb2O5 from the orthorhombic to monoclinic phases with an associated morphological variation revealed through atomic force microscopy and field-emission scanning electron microscopy analyses. The films’ specklegrams are recorded under thermal stress; the inertia moment (IM) and fractal analyses are computed and compared with the root-mean-square surface roughness of the films. The lacunarity analysis of the AFM films agrees well with the specklegrams. Thus, the lower IM and lacunarity values of the specklegrams can be regarded as indicators of the good quality of thin films. |
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| Keywords: | cross-correlation, fractal dimension, inertia moment, lacunarity, speckle, surface roughness. |
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| Year of publishing: | 2022 |
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| Number of pages: | 15 |
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| Numbering: | 61, 4 |
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| COBISS_ID: | 113431555 |
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| URN: | URN:SI:UNG:REP:WEZFL1VV |
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| DOI: | 10.1117/1.OE.61.4.044106 |
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| License: | 
This work is available under this license: Creative Commons Attribution Non-Commercial No Derivatives 4.0 International |
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| Views: | 496 |
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| Downloads: | 0 |
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