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Title:Fractal and inertia moment analyses for thin film quality monitoring
Authors:ID Swapna, Mohanachandran Nair Sindhu, UNIVERSITY OF KERALA (Author)
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Language:English
Work type:Not categorized
Typology:1.01 - Original Scientific Article
Organization:UNG - University of Nova Gorica
Abstract:The widespread applications of thin films in optronics demand innovative techniques for its characterizations. The work reported here proposes electronic speckle pattern interferometry and fractal-based methods for assessing the quality of thin films taking the industrially relevant molybdenum oxide (MoO3) incorporated niobium oxide (Nb2O5) films. The films with different levels of MoO3 incorporation (1, 2, 3, 5, and 10 wt. %) are prepared by radio frequency sputtering. The study reveals the structure modifications of Nb2O5 from the orthorhombic to monoclinic phases with an associated morphological variation revealed through atomic force microscopy and field-emission scanning electron microscopy analyses. The films’ specklegrams are recorded under thermal stress; the inertia moment (IM) and fractal analyses are computed and compared with the root-mean-square surface roughness of the films. The lacunarity analysis of the AFM films agrees well with the specklegrams. Thus, the lower IM and lacunarity values of the specklegrams can be regarded as indicators of the good quality of thin films.
Keywords:cross-correlation, fractal dimension, inertia moment, lacunarity, speckle, surface roughness.
Publication version:Version of Record
Year of publishing:2022
Number of pages:15
Numbering:4, 61
PID:20.500.12556/RUNG-7442 New window
COBISS.SI-ID:113431555 New window
DOI:10.1117/1.OE.61.4.044106 New window
NUK URN:URN:SI:UNG:REP:WEZFL1VV
Publication date in RUNG:30.06.2022
Views:1390
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Record is a part of a journal

Title:Optical Engineering
Year of publishing:2022
ISSN:1560-2303

Licences

License:CC BY-NC-ND 4.0, Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International
Link:http://creativecommons.org/licenses/by-nc-nd/4.0/
Description:The most restrictive Creative Commons license. This only allows people to download and share the work for no commercial gain and for no other purposes.
Licensing start date:30.06.2022

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