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Title:Single crystal synthesis and surface electronic structure of Bi_{1.993}Cr_{0.007}Se_{3}
Authors:ID Gardonio, Sandra (Author)
ID Benher, Zipporah Rini (Author)
ID Fanetti, Mattia (Author)
ID Moras, Paolo (Author)
ID Sheverdyaeva, Polina M. (Author)
ID Valant, Matjaž (Author)
Files:URL https://pubs.rsc.org/en/Content/ArticleLanding/2024/TC/D4TC01967A
 
.pdf D4TC01967A.pdf (2,05 MB)
MD5: 8228C56CC6B3CC524779A8B45604DEF0
 
Language:English
Work type:Unknown
Typology:1.01 - Original Scientific Article
Organization:UNG - University of Nova Gorica
Keywords:topological insulators, magnetic atoms, crystal synthesis, formation of clusters, surface electronic structure
Publication status:Published
Publication version:Author Accepted Manuscript
Publication date:01.01.2024
Year of publishing:2024
Number of pages:str. 1-6
Numbering:Vol. , issue
PID:20.500.12556/RUNG-9232 New window
COBISS.SI-ID:204816131 New window
UDC:620.1/.2
ISSN on article:2050-7534
DOI:10.1039/D4TC01967A New window
NUK URN:URN:SI:UNG:REP:1PIV28ET
Publication date in RUNG:21.08.2024
Views:383
Downloads:3
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Record is a part of a journal

Title:Journal of materials chemistry : Materials for optical and electronic devices
Shortened title:J. mater. chem. C
Publisher:RSC Publications
ISSN:2050-7534
COBISS.SI-ID:16529686 New window

Document is financed by a project

Funder:ARIS - Slovenian Research and Innovation Agency
Project number:P2-0412
Name:Heterogeni procesi na površinah trdnin za trajnostne tehnologije

Funder:ARIS - Slovenian Research and Innovation Agency
Project number:J2-3039
Name:Razvoj "pravega" topološkega izolatorja na osnovi Bi2Se3 z visoko 3D upornostjo

Licences

License:CC BY-NC 3.0, Creative Commons Attribution-NonCommercial 3.0 Unported
Link:http://creativecommons.org/licenses/by-nc/3.0/
Description:You are free to reproduce and redistribute the material in any medium or format. You are free to remix, transform, and build upon the material. You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use. You may not use the material for commercial purposes. You may not apply legal terms or technological measures that legally restrict others from doing anything the license permits.

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